Progress in Copper-based Wafer Bonding

نویسندگان

  • Chuan Seng Tan
  • Anantha Chandrakasan
  • Rafael Reif
چکیده

This article discusses a method of wafer-to-wafer bonding using metallic copper as the bonding medium. This method is commonly known as thermo-compression bonding. Bonding process is described and characterization results are presented. Reliability issues related to voids formation in the bonded layer is discussed. A survey on progress of copper-based wafer bonding and its application for 3-D ICs is included.

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تاریخ انتشار 2007